| CPC H01L 21/67115 (2013.01) [C23C 16/4586 (2013.01); C23C 16/481 (2013.01); C23C 16/488 (2013.01); H01L 21/67017 (2013.01); H01L 21/67103 (2013.01); H01L 21/67161 (2013.01); H01L 21/6719 (2013.01); H01L 21/67248 (2013.01); H01L 21/68735 (2013.01); H01L 21/68785 (2013.01); H01J 37/32449 (2013.01)] | 17 Claims |

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1. An apparatus for supporting a substrate during a reaction process, the apparatus comprising:
a susceptor heater assembly comprising a substrate support surface, a base, and a side surface; and
a radiation shield coupled to the susceptor heater assembly, wherein the radiation shield is positioned opposite the substrate support surface proximate to a bottom surface of the base, wherein the radiation shield comprises a plate having an outer diameter and an inner diameter, and wherein the plate is coupled to the side surface of the susceptor heater assembly at the outer diameter and is spaced apart a distance at the inner diameter from a movable pedestal adapted to vertically position the susceptor heater assembly in the reaction chamber.
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