| CPC H01J 37/32568 (2013.01) [H01J 37/32348 (2013.01); H01J 37/3244 (2013.01); H01J 37/32541 (2013.01); H01J 37/32559 (2013.01); H01J 2237/032 (2013.01); H01J 2237/036 (2013.01); H01J 2237/038 (2013.01)] | 6 Claims |
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1. An active gas generation apparatus configured to generate an active gas by activating a source gas supplied to a discharge space, the active gas generation apparatus comprising:
a housing configured to house an electrode structure in an in-housing space, the housing having conductivity; and
the electrode structure disposed on a bottom surface of the housing,
wherein the housing has a bottom surface structure including a flat surface and a buffer space recessed in a depth direction from the flat surface, and the electrode structure is disposed to close the buffer space,
wherein the electrode structure includes:
a first electrode component, and
a second electrode component provided below the first electrode component,
wherein the first electrode component includes a first electrode dielectric film and a first electrode conductive film formed on an upper surface of the first electrode dielectric film,
wherein the second electrode component includes a second electrode dielectric film and a second electrode conductive film formed on a lower surface of the second electrode dielectric film, and the second electrode conductive film and the flat surface of the housing are in contact with each other,
wherein the second electrode dielectric film has a dielectric through hole penetrating the second electrode dielectric film in a region overlapping the buffer space in a plan view, the second electrode conductive film has a conductive film opening in a region overlapping the buffer space in a plan view, the conductive film opening overlaps the dielectric through hole in a plan view, and an outer circumferential line of the conductive film opening is defined as an electrode boundary line,
wherein the second electrode component further includes a cover dielectric film covering the electrode boundary line of the second electrode conductive film in the buffer space, and the cover dielectric film has a cover through hole penetrating the cover dielectric film in a region overlapping the dielectric through hole in a plan view,
the active gas generation apparatus further comprising:
a shield dielectric film provided in a region overlapping the dielectric through hole and the cover through hole in a plan view on a bottom surface of the buffer space, and
a gas ejection port provided to penetrate a bottom surface of the buffer space in a peripheral region of the shield dielectric film,
wherein the gas ejection port overlaps the cover dielectric film in a plan view, and does not overlap the dielectric through hole nor the cover through hole in a plan view,
wherein an AC voltage is applied to the first electrode conductive film, and the second electrode conductive film is set to a reference potential through the housing,
wherein a space in which the first electrode dielectric film and the second electrode dielectric film face each other is defined as a main dielectric space, and a space in which the first electrode dielectric film and the shield dielectric film face each other is defined as an auxiliary dielectric space,
wherein a region where the first and second electrode conductive films overlap in a plan view in the main dielectric space is defined as a main discharge space, a region including the dielectric through hole and the cover through hole in the auxiliary dielectric space is defined as an auxiliary discharge space, and the auxiliary discharge space includes a part of the buffer space above the shield dielectric film,
wherein the discharge space includes the main discharge space and the auxiliary discharge space, and
wherein a path leading from the auxiliary discharge space to the gas ejection port is defined as an active gas flow path.
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