US 12,424,414 B2
Semiconductor processing system with a manifold for equal splitting and common divert architecture
Arun Chakravarthy Chakravarthy, Panruti (IN); Vinay K. Prabhakar, Fremont, CA (US); Dharma Ratnam Srichurnam, Hyderabad (IN); and Hossein Rezvantalab, Santa Clara, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Oct. 19, 2021, as Appl. No. 17/505,323.
Prior Publication US 2023/0124246 A1, Apr. 20, 2023
Int. Cl. H01J 37/32 (2006.01)
CPC H01J 37/32449 (2013.01) [H01J 37/32743 (2013.01); H01J 37/32899 (2013.01); H01J 2237/33 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A semiconductor processing system, comprising:
a lid plate;
a gas splitter seated on the lid plate, the gas splitter comprising a top surface and a plurality of side surfaces, wherein the gas splitter defines:
a first gas inlet and a second gas inlet, with each of the first gas inlet and the second gas inlet extending through at least one of the plurality of side surfaces;
a plurality of first gas outlets, each first gas outlet extending through the top surface;
a plurality of second gas outlets, each second gas outlet extending through the top surface at a location proximate a respective one of the plurality of first gas outlets;
a plurality of first gas lumens that extend between and fluidly couple the first gas inlet with each of the plurality of first gas outlets;
a plurality of second gas lumens that extend between a fluidly couple the second gas inlet with each of the plurality of second gas outlets; and
a plurality of mixing channels, each mixing channel comprising a mixing outlet extending through one of the plurality of side surfaces and a mixing inlet extending through the top surface and being at a location proximate the first gas outlet and the second gas outlet;
a plurality of passive flow control devices, wherein:
each of the plurality of passive flow control devices is coupled with a respective one of the plurality of first gas lumens or a respective one of the plurality of second gas lumens; and
each of the plurality of passive flow control devices defines an orifice having a fixed diameter that is less than a diameter of the respective one of the plurality of first gas lumens or the respective one of the plurality of second gas lumens;
a plurality of first orifice holders, wherein:
each of the first orifice holders is coupled with a respective side surface of the gas splitter;
one of the plurality of passive flow control devices is seated between the gas splitter and each of the first orifice holders; and
each of the first orifice holders defines a first intermediate gas lumen that fluidly couples a first segment of a respective one of the first gas lumens with a second segment of the respective one of the first gas lumens;
a plurality of second orifice holders, wherein:
each of the second orifice holders is coupled with a respective side surface of the gas splitter;
one of the plurality of passive flow control devices is seated within each of the second orifice holders; and
each of the second orifice holders defines a second intermediate gas lumen that fluidly couples a first segment of a respective one of the second gas lumens with a second segment of the respective one of the second gas lumens;
a plurality of output manifolds seated on the lid plate; and
a plurality of output weldments, each output weldment fluidly coupling a respective one of the mixing outlets with a respective one of the output manifolds.