US 12,424,412 B2
Apparatus for providing RF power and operating method thereof
Siyoung Koh, Suwon-si (KR); Hadong Jin, Suwon-si (KR); Namkyun Kim, Suwon-si (KR); Seungbo Shim, Suwon-si (KR); Sungyong Lim, Suwon-si (KR); and Sungyeol Kim, Suwon-si (KR)
Assigned to Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Jun. 29, 2023, as Appl. No. 18/344,307.
Claims priority of application No. 10-2023-0031570 (KR), filed on Mar. 10, 2023.
Prior Publication US 2024/0304420 A1, Sep. 12, 2024
Int. Cl. H01J 37/32 (2006.01); G01R 27/16 (2006.01)
CPC H01J 37/32183 (2013.01) [G01R 27/16 (2013.01); H01J 37/32926 (2013.01); H01J 37/32935 (2013.01)] 13 Claims
OG exemplary drawing
 
1. An apparatus configured to provide radio frequency (RF) power, the apparatus comprising:
a load comprising a process chamber;
an RF power generator configured to provide the RF power through a cable electrically connected to the load; and
a reflected power controller configured to detect reflected power from the load in a delivery mode and configured to control the RF power according to the reflected power that was detected,
wherein the load further comprises:
a user-defined load corresponding to the process chamber; and
a dummy load having impedance that is configured to reduce the reflected power,
wherein the user-defined load is between the dummy load and the cable,
wherein the user-defined load produces a voltage standing wave ratio (VSWR) of 1.1 or less, and
wherein the reflected power controller is further configured to output control data for calibrating the reflected power according to the VSWR associated with the user-defined load.