US 12,424,410 B2
RF pulsing within pulsing for semiconductor RF plasma processing
Maolin Long, Santa Clara, CA (US); Yuhou Wang, Fremont, CA (US); Ying Wu, Livermore, CA (US); and Alex Paterson, San Jose, CA (US)
Assigned to Lam Research Corporation, Fremont, CA (US)
Filed by Lam Research Corporation, Fremont, CA (US)
Filed on Jul. 6, 2023, as Appl. No. 18/348,320.
Application 18/348,320 is a continuation of application No. 17/729,451, filed on Apr. 26, 2022, granted, now 11,728,136.
Application 17/729,451 is a continuation of application No. 16/888,613, granted, now 11,342,159, issued on May 24, 2022, previously published as PCT/US2018/062765, filed on Nov. 28, 2018.
Claims priority of provisional application 62/596,759, filed on Dec. 8, 2017.
Claims priority of provisional application 62/596,094, filed on Dec. 7, 2017.
Prior Publication US 2023/0360883 A1, Nov. 9, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. H01J 37/32 (2006.01); H03K 4/92 (2006.01)
CPC H01J 37/32128 (2013.01) [H01J 37/3211 (2013.01); H03K 4/92 (2013.01); H01J 2237/334 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A matchless plasma source comprising:
an amplification circuit configured to receive a filtered waveform, wherein the amplification circuit is configured to provide an amplified waveform based on the filtered waveform, wherein the filtered waveform includes a first series of clock pulses followed by a state, wherein the state is followed a second series of clock pulses;
a controller coupled to the amplification circuit, wherein the controller is configured to control a shape of the amplified waveform to facilitate providing a shaped waveform; and
a reactive circuit coupled to the amplification circuit to remove harmonics from the shaped waveform to provide a sinusoidal radio frequency (RF) signal to an electrode.
 
9. A plasma tool comprising:
a plasma chamber having an electrode; and
a matchless plasma source coupled to the plasma chamber, the matchless plasma source including:
an amplification circuit configured to receive a filtered waveform, wherein the amplification circuit is configured to provide an amplified waveform based on the filtered waveform, wherein the filtered waveform includes a first series of clock pulses followed by a state, wherein the state is followed a second series of clock pulses;
a controller coupled to the amplification circuit, wherein the controller is configured to control a shape of the amplified waveform to facilitate providing a shaped waveform; and
a reactive circuit coupled to the amplification circuit to remove harmonics from the shaped waveform to provide a sinusoidal radio frequency (RF) signal to the electrode.
 
17. A method comprising:
receiving a filtered waveform, wherein the filtered waveform includes a first series of clock pulses followed by a state, wherein the state is followed a second series of clock pulses;
generating an amplified waveform based on the filtered waveform;
controlling a shape of the amplified waveform to facilitate providing a shaped waveform; and
removing harmonics from the shaped waveform to provide a sinusoidal radio frequency (RF) signal to an electrode.