US 12,422,759 B2
Component for use in a lithographic apparatus, method of protecting a component and method of protecting tables in a lithographic apparatus
Marcus Adrianus Van De Kerkhof, Helmond (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Sep. 29, 2023, as Appl. No. 18/375,281.
Application 18/375,281 is a division of application No. 17/428,897, granted, now 12,001,149, previously published as PCT/EP2020/051775, filed on Jan. 24, 2020.
Claims priority of application No. 19156202 (EP), filed on Feb. 8, 2019.
Prior Publication US 2024/0027925 A1, Jan. 25, 2024
Int. Cl. G03F 7/00 (2006.01); G03F 1/38 (2012.01); G03F 1/82 (2012.01); H01L 21/67 (2006.01)
CPC G03F 7/70925 (2013.01) [G03F 1/38 (2013.01); G03F 1/82 (2013.01); G03F 7/707 (2013.01); G03F 7/70916 (2013.01); H01L 21/67028 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A method comprising:
providing a protective cover that is shaped to protect at least part of a component of a lithographic apparatus, the protective cover having a contact surface that is arranged to adhere to a first surface of at least part of the lithographic apparatus or the component;
bringing the protective cover into proximity with the component so as to cause the contact surface to adhere to the lithographic apparatus or the component and remain adhered without the application of external force,
wherein the contact surface includes a coating that is configured to adhere to the first surface, and
wherein the coating is a material that has a different electron affinity to the first surface, such that contact between the first surface and the contact surface causes contact electrification between the surfaces.