US 12,422,747 B2
Negative photosensitive resin composition, pattern formation method, and laminated film
Takuto Nakao, Kyoto (JP); Tomoyuki Shibagaki, Kyoto (JP); Yuji Nakamura, Kyoto (JP); Kenichi Yamagata, Kawasaki (JP); Takahiro Kondo, Kawasaki (JP); Masahiro Masujima, Kawasaki (JP); and Hirofumi Imai, Kawasaki (JP)
Assigned to SAN-APRO LTD., Kyoto (JP); and TOKYO OHKA KOGYO CO., LTD., Kawasaki (JP)
Appl. No. 18/003,623
Filed by SAN-APRO LTD., Kyoto (JP); and TOKYO OHKA KOGYO CO., LTD., Kawasaki (JP)
PCT Filed Jun. 2, 2021, PCT No. PCT/JP2021/021027
§ 371(c)(1), (2) Date Dec. 28, 2022,
PCT Pub. No. WO2022/009569, PCT Pub. Date Jan. 13, 2022.
Claims priority of application No. 2020-117686 (JP), filed on Jul. 8, 2020.
Prior Publication US 2023/0236505 A1, Jul. 27, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/004 (2006.01); C07C 303/32 (2006.01); C07C 381/12 (2006.01); C07D 335/16 (2006.01); G03F 7/021 (2006.01); G03F 7/038 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); G03F 7/42 (2006.01)
CPC G03F 7/0045 (2013.01) [C07C 303/32 (2013.01); C07C 381/12 (2013.01); C07D 335/16 (2013.01); G03F 7/0217 (2013.01); G03F 7/0382 (2013.01); G03F 7/0385 (2013.01); G03F 7/32 (2013.01); G03F 7/425 (2013.01); G03F 7/426 (2013.01)] 10 Claims
 
1. A negative photosensitive resin composition comprising:
an epoxy group-containing resin (A); and
a cationic polymerization initiator (I),
wherein the cationic polymerization initiator (I) includes a sulfonium salt (I0) represented by General Formula (I0),

OG Complex Work Unit Chemistry
wherein in Formula (I0), R1 represents a thioxanthonyl group; R2 represents an aryl group having 6 to 30 carbon atoms, in which a part of hydrogen atoms in the aryl group is substituted with a substituent (t), the substituent (t) being at least one selected from the group consisting of an alkyl group having 1 to 18 carbon atoms or an alkoxy group having 1 to 18 carbon atoms, R3 to R5 are each an alkyl group or an alkoxy group, k, m, and n represent the numbers of R3, R4, and RS, in which k is an integer of 0 to 4, m is an integer of 0 to 3, and n is an integer of 1 to 4, in a case where each of k, m, and n is 2 or more, a plurality of R3's, R4's, or R5's may be the same or different from each other, A is a group represented by —S—, —O—, —SO—, —SO2—, or —CO—, O is an oxygen atom, S is a sulfur atom, and X− represents a monovalent polyatomic anion.