US 12,422,357 B2
Chamber moisture control using narrow optical filters measuring emission lines
Sven Schramm, Kahl am Main (DE); Martin Hilkene, Gilroy, CA (US); Elias Martinez, San Jose, CA (US); and Amir Bayati, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on May 16, 2023, as Appl. No. 18/197,868.
Prior Publication US 2024/0385109 A1, Nov. 21, 2024
Int. Cl. G01N 21/3577 (2014.01); G01N 21/25 (2006.01); G01N 21/64 (2006.01)
CPC G01N 21/3577 (2013.01) [G01N 21/255 (2013.01); G01N 2021/6471 (2013.01); G01N 2201/0238 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A semiconductor processing tool, comprising:
a chamber;
a viewport through a wall of the chamber; and
a detection module optically coupled to the viewport, wherein the detection module comprises:
an optical bandpass filter with a passband that is up to 10 nm, the optical bandpass filter optically coupled to a light source; and
a first detector optically coupled to the optical bandpass filter; and
a second detector, wherein the second detector is optically coupled to the light source without an intervening optical bandpass filter.