| CPC C25B 11/052 (2021.01) [C23C 16/305 (2013.01); C23C 16/4486 (2013.01); C25B 1/04 (2013.01); C25B 11/054 (2021.01); C25B 11/075 (2021.01); C25B 11/031 (2021.01); C25B 11/061 (2021.01)] | 17 Claims |

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1. An aerosol-assisted chemical vapor-deposition (AACVD) method, comprising:
aerosol-assisted chemical vapor-depositing a nickel carbamate compound to form nickel sulfide (NiS) nanowires on a conductive support, wherein the NiS nanowires are in a form of monocrystalline NiS in a hexagonal phase;
wherein:
the NiS nanowires comprise a microstructure present directly on a surface of the conductive support, the microstructure comprising a nanocrystalline morphology that protrudes across the surface of the conductive support, and
a mass density of the NiS nanowires on the conductive support is from greater than 0.18 to less than 0.45 mg/cm2.
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