CPC G06T 7/0004 (2013.01) [G06F 18/214 (2023.01); G06F 18/241 (2023.01); G06N 3/08 (2013.01); G06T 2207/20076 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30148 (2013.01)] | 9 Claims |
1. A defect management apparatus comprising:
a first inspection device;
a second inspection device; and
a processor, the processor configured to:
acquire first inspection information and second inspection information, the first inspection information including first defect positions relating to defects detected with the first inspection device for an inspection target and also including corresponding first classification labels indicating classifications of the defects, the second inspection information including second defect positions without classification labels, relating to defects detected with the second inspection device different from the first inspection device for the inspection target;
determine a first defect position corresponding to a second defect position as a corresponding defect position, based on the first inspection information and the second inspection information; and
divert the first classification label corresponding to the corresponding defect position as a second classification label of the second defect position,
wherein if a plurality of first defect positions corresponding to the second defect position exist, the processing circuitry determines the plurality of first defect positions as the corresponding defect positions.
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