US 12,092,965 B2
Process variability aware adaptive inspection and metrology
Venugopal Vellanki, San Jose, CA (US); Vivek Kumar Jain, Milpitas, CA (US); and Stefan Hunsche, Santa Clara, CA (US)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on May 6, 2021, as Appl. No. 17/313,135.
Application 17/313,135 is a continuation of application No. 16/696,263, filed on Nov. 26, 2019, granted, now 11,003,093.
Application 16/696,263 is a continuation of application No. 15/546,592, granted, now 10,514,614, previously published as PCT/EP2016/051073, filed on Jan. 20, 2016.
Claims priority of provisional application 62/117,261, filed on Feb. 17, 2015.
Claims priority of provisional application 62/116,256, filed on Feb. 13, 2015.
Prior Publication US 2021/0255548 A1, Aug. 19, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. G06F 30/20 (2020.01); G03F 1/60 (2012.01); G03F 1/84 (2012.01); G03F 7/00 (2006.01); G06F 30/398 (2020.01); G06N 20/00 (2019.01); G06F 119/18 (2020.01)
CPC G03F 7/7065 (2013.01) [G03F 1/60 (2013.01); G03F 1/84 (2013.01); G03F 7/705 (2013.01); G03F 7/70525 (2013.01); G03F 7/70641 (2013.01); G03F 7/70666 (2013.01); G06F 30/398 (2020.01); G06N 20/00 (2019.01); G06F 30/20 (2020.01); G06F 2119/18 (2020.01)] 27 Claims
OG exemplary drawing
 
1. A non-transitory computer-readable medium having instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least:
obtain measured values of one or more processing parameters under which one or more patterns are processed onto a plurality of areas on a substrate, the measured values processed into the form of a map conveying the location of the measured values on the plurality of areas on the substrate;
identify, based on the values of the one or more processing parameters, areas across the substrate for which the one or more patterns are, or are prone to be, defective resulting from production of the one or more patterns with a device manufacturing process; and
generate a map conveying the location of the identified areas on the substrate.