US 12,092,957 B2
Radiation-sensitive resin composition, method for forming resist pattern and compound
Kazuya Kiriyama, Tokyo (JP); Katsuaki Nishikori, Tokyo (JP); Takuhiro Taniguchi, Tokyo (JP); Ryuichi Nemoto, Tokyo (JP); and Ken Maruyama, Tokyo (JP)
Assigned to JSR CORPORATION, Tokyo (JP)
Filed by JSR CORPORATION, Tokyo (JP)
Filed on Oct. 22, 2021, as Appl. No. 17/508,191.
Application 17/508,191 is a continuation in part of application No. PCT/JP2020/019254, filed on May 14, 2020.
Claims priority of application No. 2019-098401 (JP), filed on May 27, 2019.
Prior Publication US 2022/0043350 A1, Feb. 10, 2022
Int. Cl. G03F 7/039 (2006.01); C07C 31/13 (2006.01); C07C 69/608 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01)
CPC G03F 7/0392 (2013.01) [C07C 31/13 (2013.01); C07C 69/608 (2013.01); G03F 7/2006 (2013.01); G03F 7/327 (2013.01)] 19 Claims
 
1. A radiation-sensitive resin composition comprising:
a resin having a partial structure represented by formula (1);
a radiation-sensitive acid generator; and
a solvent;

OG Complex Work Unit Chemistry
wherein, in the formula (1),
R1 and R2 each independently represent a substituted or unsubstituted chain aliphatic hydrocarbon group having 1 to 6 carbon atoms or a substituted or unsubstituted alicyclic hydrocarbon group having 3 to 6 carbon atoms, or R1 and R2 are bonded to each other to form a part of a 3- to 6-membered cyclic structure together with the carbon atom to which R1 and R2 are bonded;
R3 represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms and comprising an alicyclic ring, wherein the alicyclic ring comprises —CF2— group, and the carbon atom of the —CF2— group is a ring atom of the alicyclic ring;
provided that in R1 and R2, no fluorine atom is bonded to carbon atoms located at α-, β- and γ-positions of the carbon atom to which R1 and R2 are bonded;
in R3, no fluorine atom is bonded to carbon atoms located at α- and β-positions of the carbon atom to which R3 is bonded; and
* represents a bond.