CPC G02B 6/1225 (2013.01) [G02B 6/12004 (2013.01); G02B 6/12007 (2013.01); G02B 6/13 (2013.01); G02B 6/136 (2013.01); H01L 21/0275 (2013.01); H04J 14/02 (2013.01)] | 18 Claims |
1. A method for fabricating a photonic system, comprising:
using a stepper machine to lithographically pattern a semiconductor wafer with a plurality of photonic modules, wherein patterning the semiconductor wafer comprises:
patterning the semiconductor wafer with a first photonic module using at least a first photomask; and
subsequent to patterning the semiconductor wafer with the first photonic module, patterning the semiconductor wafer with a second photonic module using at least the first photomask;
wherein each of the first and second photonic modules, when patterned, comprises:
first and second boundaries;
an optical distribution network;
a first optical waveguide optically coupling the optical distribution network to a first neighboring photonic module of the plurality of photonic modules, the first neighboring photonic module being adjacent to the first boundary; and
a second optical waveguide optically coupling the optical distribution network to a second neighboring photonic module of the plurality of photonic modules, the second neighboring photonic module being adjacent to the second boundary.
|