US 12,092,865 B2
Grating and grating characteristic adjustment method and device
Shiyi Cao, Shenzhen (CN); and Zhiwu Chang, Shenzhen (CN)
Assigned to Huawei Technologies Co., Ltd., Shenzhen (CN)
Filed by HUAWEI TECHNOLOGIES CO., LTD., Guangdong (CN)
Filed on Nov. 29, 2022, as Appl. No. 18/071,485.
Application 18/071,485 is a continuation of application No. PCT/CN2021/093868, filed on May 14, 2021.
Claims priority of application No. 202010480709.1 (CN), filed on May 30, 2020.
Prior Publication US 2023/0093290 A1, Mar. 23, 2023
Int. Cl. G02B 6/12 (2006.01)
CPC G02B 6/12033 (2013.01) [G02B 6/12016 (2013.01); G02B 2006/12164 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A grating characteristic adjustment method, wherein:
a grating comprises a first optical waveguide region, a second optical waveguide region, a control component comprising an electrode layer, and an arrayed waveguide region comprising a plurality of optical waveguides, the first optical waveguide region is connected to the arrayed waveguide region, and the second optical waveguide region is connected to the arrayed waveguide region; and
the method comprises:
obtaining a target value of a grating characteristic, wherein the grating characteristic comprises any one or more of a channel spacing, a spectral width of an input diffraction peak, or a spectral width of an output diffraction peak; and
performing, based on the target value of the grating characteristic, processing on the grating to cause any one or more of the following changes of the grating: a change of a refractive index of an optical waveguide in a target waveguide region or elimination of one or more optical waveguides in the arrayed waveguide region, wherein:
the target waveguide region is any one or any combination of the first optical waveguide region, the second optical waveguide region, or the arrayed waveguide region;
the changes of the grating comprise the change of the refractive index of the optical waveguide in the target waveguide region; and
the performing, based on the target value of the grating characteristic, processing on the grating comprises:
determining a target refractive index of the target waveguide region based on the target value of the grating characteristic;
determining a target voltage of the electrode layer based on the target refractive index of the target waveguide region; and
supplying a power to the electrode layer based on the target value of the grating characteristic, wherein the supplying comprises supplying the power to the electrode layer based on the target voltage to enable the electrode layer to provide a voltage or an electric field to the optical waveguide in the target waveguide region.