US 12,092,584 B2
High throughput defect detection
Boris Golberg, Ashdod (IL)
Assigned to Applied Materials Israel Ltd., Rehovot (IL)
Filed by Applied Materials Israel Ltd., Rehovot (IL)
Filed on Apr. 26, 2022, as Appl. No. 17/729,863.
Prior Publication US 2023/0341334 A1, Oct. 26, 2023
Int. Cl. G01N 21/88 (2006.01); G01N 21/956 (2006.01)
CPC G01N 21/8851 (2013.01) [G01N 21/95623 (2013.01); G01N 2021/8864 (2013.01)] 24 Claims
OG exemplary drawing
 
1. A method for high throughput defect detection using an inspection system configured to detect defects on a sample, the method comprises:
illuminating the sample with a radiation beam;
receiving scattered portions of the radiation beam at a distribution lens of the inspection system, the distribution lens partitioned into a plurality of distribution lens plane segments;
directing the scattered portions of the radiation beam received at the plurality of distribution lens plane segments to first detection channels, wherein the scattered portions of the radiation beam received at each of the plurality of distribution lens plane segments is directed to a different one of the first detection channels;
identifying one or more of the plurality of distribution lens plane segments as a segment of interest based on the scattered portions of the radiation beam received at the first detection channels, wherein the plurality of distribution lens plane segments have corresponding pupil plane segments, and the pupil plane segments associated with the segments of interest are identified as pupil plane segments of interest;
configuring a configurable filter associated with second detection channels, wherein the configurable filter has configurable filter segments each associated with one of the pupil plane segments, and the configurable filter is configured to pass radiation on the pupil plane segments of interest and to block radiation on all other pupil plane segments (hereinafter non-of-interest pupil plane segments); and
performing, using the second detection channels, a partially masked pupil plane inspection process.