	US 12,091,427 B2
	Metal complexes for gas-phase thin-film deposition
Joerg Sundermeyer, Marburg (DE); Henrik Schumann, Weinbach (DE); Wolf Schorn, Waldbronn (DE); Nicholas Rau, Marburg (DE); Annika Frey, Hanau (DE); Ralf Karch, Kleinostheim (DE); Eileen Woerner, Nidderau (DE); and Angelino Doppiu, Seligenstadt (DE)
Assigned to Umicore AG & CO. KG, Hanau-Wolfgang (DE)
Appl. No. 17/599,126
Filed by Umicore AG & Co. KG, Hanau-Wolfgang (DE)
PCT Filed Mar. 27, 2020, PCT No. PCT/EP2020/058865 § 371(c)(1), (2) Date Sep. 28, 2021, PCT Pub. No. WO2020/193794, PCT Pub. Date Oct. 1, 2020.
Claims priority of application No. 19165935 (EP), filed on Mar. 28, 2019.
Prior Publication US 2022/0153768 A1, May 19, 2022
Int. Cl. C07F 15/00 (2006.01); C23C 16/18 (2006.01); C23C 16/455 (2006.01)

CPC C07F 15/0033 (2013.01) [C07F 15/0046 (2013.01); C23C 16/18 (2013.01); C23C 16/45553 (2013.01)]

13 Claims

1. A metal complex of formula (I):

[M(L¹)_x(L²)_y(hydra)_z]_n formula (I)

wherein:

M =selected from the group consisting of Co, Ga, Ge, Ru, In, and Ir,


L¹=	neutral or anionic ligand, with x = 0 or 1,
L²=	neutral or anionic ligand, with y = 0 or 1,
(hydra) =	acetone dimethylhydrazone monoanion, with z = 1, 2, or 3,
n =	1 or 2, and the total charge of the complex is 0.