US 12,416,076 B2
Cycloheptatriene molybdenum (0) precursors for deposition of molybdenum films
Andrea Leoncini, Singapore (SG); Paul Mehlmann, Singapore (SG); Nemanja Dordevic, Singapore (SG); Han Vinh Huynh, Singapore (SG); and Doreen Wei Ying Yong, Singapore (SG)
Assigned to Applied Materials, Inc., Santa Clara, CA (US); and National University of Singapore, Singapore (SG)
Filed by Applied Materials, Inc., Santa Clara, CA (US); and National University of Singapore, Singapore (SG)
Filed on Dec. 20, 2022, as Appl. No. 18/085,006.
Application 18/085,006 is a division of application No. 17/146,890, filed on Jan. 12, 2021, granted, now 11,530,477.
Prior Publication US 2023/0129073 A1, Apr. 27, 2023
Int. Cl. C23C 16/18 (2006.01); C07F 11/00 (2006.01); C23C 16/32 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/42 (2006.01); C23C 16/455 (2006.01)
CPC C23C 16/18 (2013.01) [C07F 11/00 (2013.01); C23C 16/32 (2013.01); C23C 16/34 (2013.01); C23C 16/405 (2013.01); C23C 16/42 (2013.01); C23C 16/45523 (2013.01)] 19 Claims
OG exemplary drawing
 
1. A method of depositing a film, the method comprising:
exposing a substrate to a molybdenum(0) precursor comprising at least one cycloheptatriene ligand and one or more neutral ligands coordinated by carbon, nitrogen, or phosphorous, the one or more neutral ligands comprising a monodentate ligand selected from one or more of:

OG Complex Work Unit Chemistry
wherein each R may be independently selected from Me-, Et-, iPr-, and tBu-; and
exposing the substrate to a reactant to react with the molybdenum(0) precursor to form a molybdenum film on the substrate.