US 12,087,555 B2
Method and system for cleaning a process chamber
Kalyanjit Ghosh, Pleasanton, CA (US); Shailendra Srivastava, Fremont, CA (US); Tejas Ulavi, San Jose, CA (US); Yusheng Zhou, Sunnyvale, CA (US); Amit Kumar Bansal, Milpitas, CA (US); and Sanjeev Baluja, Campbell, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Dec. 16, 2022, as Appl. No. 18/083,301.
Application 18/083,301 is a division of application No. 16/855,126, filed on Apr. 22, 2020, granted, now 11,532,462.
Application 16/855,126 is a division of application No. 15/701,222, filed on Sep. 11, 2017, granted, now 10,636,628, issued on Apr. 28, 2020.
Prior Publication US 2023/0128297 A1, Apr. 27, 2023
Int. Cl. H01J 37/32 (2006.01); B08B 7/00 (2006.01); H01L 21/67 (2006.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01); G03F 7/42 (2006.01)
CPC H01J 37/32495 (2013.01) [H01J 37/32862 (2013.01); H01L 21/67017 (2013.01); B08B 7/0021 (2013.01); G03F 7/427 (2013.01); H01J 37/32834 (2013.01); H01L 21/67028 (2013.01); H01L 21/6831 (2013.01); H01L 21/68742 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A method of cleaning a process chamber, comprising:
positioning a top purge barrier in a first position in an interior volume of a chamber body of the process chamber with the top purge barrier separating a process volume disposed above the top purge barrier and a purge volume disposed below the top purge barrier, wherein
a substrate support is positioned in the purge volume,
the top purge barrier comprises a cover substrate and a top edge member disposed above the substrate support with the cover substrate spaced apart from the substrate support when the top purge barrier is in the first position,
a process kit comprising the top edge member and a pumping liner is disposed in the interior volume, and
the pumping liner separates the purge volume from an outer flow path disposed between the chamber body and the pumping liner;
performing a cleaning process of the process volume with the top purge barrier in the first position, comprising:
flowing a purge gas to the purge volume and from the purge volume to the process volume through a purge gap extending through the top purge barrier;
flowing a cleaning fluid from a cleaning fluid supply to the process volume disposed in the interior volume;
flowing the cleaning fluid and the purge gas from the process volume to the outer flow path; and
flowing the cleaning fluid and the purge gas in the outer flow path to an exhaust outlet in fluid communication with the outer flow path and in the chamber body, wherein the flowing of the purge gas through the purge gap blocks the cleaning fluid in the process volume from flowing to the purge volume.