US 12,087,542 B2
Image contrast enhancement in sample inspection
Yixiang Wang, Fremont, CA (US); and Frank Nan Zhang, San Jose, CA (US)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Nov. 1, 2021, as Appl. No. 17/516,654.
Application 17/516,654 is a continuation of application No. 16/651,337, granted, now 11,164,719, previously published as PCT/EP2018/075984, filed on Sep. 25, 2018.
Claims priority of provisional application 62/566,195, filed on Sep. 29, 2017.
Prior Publication US 2022/0122803 A1, Apr. 21, 2022
Int. Cl. H01J 37/28 (2006.01); G01N 23/203 (2006.01); G01N 23/2251 (2018.01); H01J 37/26 (2006.01)
CPC H01J 37/28 (2013.01) [G01N 23/203 (2013.01); G01N 23/2251 (2013.01); H01J 37/261 (2013.01); H01J 2237/0048 (2013.01); H01J 2237/2817 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An apparatus configured to inspect a sample, the apparatus comprising:
a source of charged particles;
a stage;
optics configured to direct a beam of the charged particles to a sample supported on the stage; and
a controller configured to control the source and the optics;
wherein the source, optics and controller are collectively configured to:
depositing a first amount of electric charges into a region of the sample, during a first time period;
depositing a second amount of electric charges into the region, during a second time period;
wherein an average rate of deposition during the first time period and an average rate of deposition during the second time period are different.