CPC G06T 7/0004 (2013.01) [G01N 21/4788 (2013.01); G02B 5/3083 (2013.01); G02B 27/283 (2013.01); G02B 27/4205 (2013.01); G03F 7/70616 (2013.01); G03F 7/706851 (2023.05); G06T 2207/10148 (2013.01); G06T 2207/30148 (2013.01)] | 14 Claims |
1. A metrology apparatus comprising:
a substrate holder configured to hold a substrate comprising a structure;
projection optics configured to project illuminating radiation onto the structure;
a detection apparatus configured to simultaneously acquire multiple images of an object at a plurality of different focus levels and to detect the illuminating radiation subsequent to it having been scattered by the structure, the detection apparatus comprising:
a modulator configured to obtain generate multiple beam copies of an incoming beam;
an optical element configured to impose different phase delays to at least two of the multiple beam copies;
a detector operable to capture the multiple beam copies,
wherein the modulator is configured such that at least two of the multiple beam copies are captured at different focus levels; and
a processor operable to calculate a value for a performance parameter relating to the structure directly from the effect of the performance parameter on a phase of illuminating radiation, as calculated using one or more detected characteristics of the multiple beam copies captured at the different focus levels.
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