US 12,085,913 B2
Method for generating a control scheme and device manufacturing method
Marc Hauptmann, Turnhout (BE); Amir Bin Ismail, Eindhoven (NL); Rizvi Rahman, Eindhoven (NL); and Jiapeng Li, Veldhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/601,307
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Mar. 19, 2020, PCT No. PCT/EP2020/057687
§ 371(c)(1), (2) Date Oct. 4, 2021,
PCT Pub. No. WO2020/212068, PCT Pub. Date Oct. 22, 2020.
Claims priority of application No. 19169933 (EP), filed on Apr. 17, 2019; application No. 19171535 (EP), filed on Apr. 29, 2019; and application No. 19209638 (EP), filed on Nov. 18, 2019.
Prior Publication US 2022/0187786 A1, Jun. 16, 2022
Int. Cl. G05B 19/404 (2006.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01)
CPC G05B 19/404 (2013.01) [G03F 7/70516 (2013.01); G05B 2219/45031 (2013.01); G05B 2219/50296 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for generating a sampling scheme for a device manufacturing process, the method comprising:
obtaining a measurement data time series of a plurality of processed substrates;
transforming, by a hardware computer system, the measurement data time series to obtain frequency domain data;
determining, using the frequency domain data, a temporal sampling scheme;
determining an error offset introduced by the temporal sampling scheme on the basis of measurements on substrates performed according to the temporal sampling scheme; and
determining an improved temporal sampling scheme to compensate the error offset.