US 12,085,863 B2
Method for determining stochastic variation associated with desired pattern
Jiyou Fu, San Jose, CA (US)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on Apr. 24, 2023, as Appl. No. 18/138,383.
Application 18/138,383 is a continuation of application No. 17/610,481, granted, now 11,669,019, previously published as PCT/EP2020/061713, filed on Apr. 28, 2020.
Claims priority of provisional application 62/850,838, filed on May 21, 2019.
Prior Publication US 2023/0280659 A1, Sep. 7, 2023
Int. Cl. G03F 7/00 (2006.01); G06T 7/00 (2017.01)
CPC G03F 7/70625 (2013.01) [G06T 7/001 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method for determining shrinkage in resist of a substrate caused due to measurement via a metrology tool, the method comprising:
acquiring, from the metrology tool, a plurality of images of a pattern at a defined location on the substrate without a substrate alignment performed between captures of the images;
generating at least two data: (i) first data associated with the pattern using a first set of images of the plurality of images, and (ii) second data associated with the pattern using a second set of images of the plurality of images, wherein the first set of images comprises at least two consecutive images of the plurality of images, and the second set of images comprises at least two different consecutive images of the plurality of images; and
determining, by a hardware computer system and based on a difference between the first data and the second data, the shrinkage in the resist of the substrate.