US 12,085,856 B2
Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component
Masashi Iio, Joetsu (JP); Hiroyuki Urano, Joetsu (JP); Osamu Watanabe, Joetsu (JP); and Katsuya Takemura, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed on Jul. 30, 2021, as Appl. No. 17/389,866.
Claims priority of application No. 2020-132426 (JP), filed on Aug. 4, 2020.
Prior Publication US 2022/0043351 A1, Feb. 10, 2022
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 7/039 (2006.01); G03F 1/48 (2012.01); G03F 7/004 (2006.01); G03F 7/075 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01)
CPC G03F 7/0397 (2013.01) [G03F 1/48 (2013.01); G03F 7/0045 (2013.01); G03F 7/075 (2013.01); G03F 7/11 (2013.01); G03F 7/161 (2013.01); G03F 7/2004 (2013.01); G03F 7/322 (2013.01)] 16 Claims
OG exemplary drawing
 
1. A positive photosensitive resin composition comprising:
(A) an alkali-soluble resin containing at least one or more structures selected from a polyimide structure, a polyamide-imide structure, and a polybenzoxazole precursor structure;
(B) a crosslinkable polymer compound containing structural units represented by the following general formula (2) and the following general formula (4); and
(C) a compound having a quinonediazide structure for serving as a photosensitizer to generate an acid by light and increase a dissolution speed to an alkaline aqueous solution,

OG Complex Work Unit Chemistry
wherein R8 represents a hydrogen atom or a methyl group, X4 each represents —C(═O)—O—, a phenylene group, or a naphthylene group; R9 represents a linear, branched, or cyclic alkylene group having 1 to 15 carbon atoms, optionally containing a hydroxy group, an ester group, an ether group, or an aromatic hydrocarbon, R10 represents a hydrogen atom, a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, or is optionally bonded with R9 to form a ring; R11 represents a hydrogen atom or a linear, branched, or cyclic alkyl group having 1 to 6 carbon atoms, R12 represents a hydrogen atom or a linear alkyl group having 1 to 6 carbon atoms, and is optionally bonded with R9 to form a ring; “m” is 1; “p” is 0 or 1 for general formula (4) only; 0<b2<1.0, 0<b4<1.0, and 0<b2+b4≤1.0; R4 represents a hydrogen atom or a methyl group, X2 each represents —C(═O)—O—, —C(═O)—NH—, or —C(═O)—N(R5OH)—;
and R5 represents a divalent linear, branched, or cyclic aliphatic saturated hydrocarbon group having 1 to 12 carbon atoms, or an aromatic hydrocarbon group having 6 to 12 carbon atoms, wherein a carbon atom of the aliphatic saturated hydrocarbon group is optionally substituted with an oxygen atom; and “p” is 1 for general formula (2) only.