US 12,085,847 B2
Pellicle
Yu Yanase, Annaka (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
Filed on Sep. 1, 2023, as Appl. No. 18/241,442.
Application 18/241,442 is a continuation of application No. 17/868,871, filed on Jul. 20, 2022, granted, now 11,774,847.
Application 17/868,871 is a continuation of application No. 17/332,463, filed on May 27, 2021, granted, now 11,422,457, issued on Aug. 23, 2022.
Application 17/332,463 is a continuation of application No. 16/700,228, filed on Dec. 2, 2019, granted, now 11,054,738, issued on Jul. 6, 2021.
Claims priority of application No. 2018-226457 (JP), filed on Dec. 3, 2018.
Prior Publication US 2023/0408907 A1, Dec. 21, 2023
This patent is subject to a terminal disclaimer.
Int. Cl. G03F 1/64 (2012.01); G03F 1/62 (2012.01)
CPC G03F 1/64 (2013.01) [G03F 1/62 (2013.01)] 20 Claims
 
1. A pellicle, having the increase rate of released gas of less than 15% measured under vacuum after the pellicle being left to stand for 10 minutes in an atmosphere of 23° C. and 1×10−3 Pa or less, in comparison to the amount of the gas before said measurement.