US 12,084,767 B2
Gas-inlet element for a CVD reactor
Oliver Schön, Herzogenrath (DE)
Assigned to AIXTRON SE, Herzogenrath (DE)
Appl. No. 17/626,113
Filed by AIXTRON SE, Herzogenrath (DE)
PCT Filed Jul. 10, 2020, PCT No. PCT/EP2020/069473
§ 371(c)(1), (2) Date Jan. 10, 2022,
PCT Pub. No. WO2021/009019, PCT Pub. Date Jan. 21, 2021.
Claims priority of application No. 10 2019 119 019.3 (DE), filed on Jul. 12, 2019.
Prior Publication US 2022/0259737 A1, Aug. 18, 2022
Int. Cl. C23C 16/455 (2006.01); C30B 25/14 (2006.01)
CPC C23C 16/45565 (2013.01) [C30B 25/14 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A gas outlet surface (16) of a gas inlet element (2) for a chemical vapor deposition (CVD) reactor (1) or of a shielding plate (14) for the gas inlet element (2), the gas outlet surface (16) comprising:
a plurality of gas outlet openings (7, 17) arranged around a geometric center (10) of the gas outlet surface (16),
wherein respective central points of the gas outlet openings (7, 17) lie on respective corner points (8′) of polygonal, identically shaped cells (8) that each have a geometric central point (9),
wherein a position and a length of respective edges (8″) of the cells (8) are defined by intersecting reference lines (13, 13′, 13″),
wherein the reference lines (13, 13′, 13″) are assigned to at least two families of lines,
wherein the reference lines of a respective family of lines extend linearly and parallel to one another over an entirety of the gas outlet surface (16),
wherein the geometric center (10) of the gas outlet surface (16) is spaced apart from a first one of the corner points (8′) by one-third±10 percent of the length of a first one of the edges (8″), and
wherein a central point of a central one of the gas distribution openings (7.1) is offset from the geometric center (10) of the gas outlet surface (16).