US 11,756,188 B2
Determining a critical dimension variation of a pattern
Vadim Vereschagin, Hod-HaSharon (IL); Roman Kris, Jerusalem (IL); Ishai Schwarzband, Or-Yehuda (IL); Boaz Cohen, Lehavim (IL); Evgeny Bal, Natanya (IL); and Ariel Shkalim, Even-Shmuel (IL)
Assigned to Applied Materials Israel Ltd., Rehovot (IL)
Filed by Applied Materials Israel Ltd., Rehovot (IL)
Filed on Mar. 14, 2022, as Appl. No. 17/694,131.
Application 17/694,131 is a continuation of application No. 16/652,970, granted, now 11,276,160, previously published as PCT/US2018/053789, filed on Oct. 1, 2018.
Claims priority of provisional application 62/634,686, filed on Feb. 23, 2018.
Claims priority of provisional application 62/567,150, filed on Oct. 2, 2017.
Prior Publication US 2022/0198639 A1, Jun. 23, 2022
Int. Cl. G06T 7/13 (2017.01); G06T 7/60 (2017.01); G06T 7/00 (2017.01)
CPC G06T 7/001 (2013.01) [G06T 7/13 (2017.01); G06T 7/60 (2013.01); G06T 2207/30148 (2013.01)] 14 Claims
OG exemplary drawing
1. A method comprising:
receiving input data comprising an image of a pattern and location data that identifies a modified portion of the pattern;
determining, by a processing device, a first parameter of a first dimension within the pattern by measuring a critical dimension parameter value with respect to at least one of a contour external to the modified portion or a contour internal to the modified portion;
determining, by the processing device, a second parameter of a second dimension outside of the pattern;
generating a combined set based on the first parameter and the second parameter; and
classifying a defect associated with the modified portion based on the combined set.