US 11,755,814 B2
Method and apparatus for layout pattern selection
Wei-jie Chen, Shenzhen (CN)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 17/422,520
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Jan. 10, 2020, PCT No. PCT/EP2020/050494
§ 371(c)(1), (2) Date Jul. 13, 2021,
PCT Pub. No. WO2020/156777, PCT Pub. Date Aug. 6, 2020.
Claims priority of application No. PCT/CN2019/073714 (WO), filed on Jan. 29, 2019.
Prior Publication US 2022/0100935 A1, Mar. 31, 2022
Int. Cl. G06F 30/30 (2020.01); G06F 30/27 (2020.01); G03F 7/00 (2006.01); G06N 3/08 (2023.01); G06F 30/398 (2020.01); G03F 1/36 (2012.01)
CPC G06F 30/398 (2020.01) [G03F 7/705 (2013.01); G06F 30/27 (2020.01); G06F 30/30 (2020.01); G06N 3/08 (2013.01); G03F 1/36 (2013.01); G03F 7/70441 (2013.01)] 20 Claims
OG exemplary drawing
1. A method comprising:
generating a plurality of features from patterns in a pattern set, wherein the plurality of generated features comprise geometrical features and a lithography aware feature and wherein the lithography aware feature is other than, or in addition to, a structure of the patterns and comprises information relating to lithographic transfer of a pattern to a substrate;
grouping, by a hardware computer system, the patterns in the pattern set into individual groups based on similarities in the plurality of generated features; and
selecting representative patterns from the individual groups to determine a training pattern for a layout patterning process.