US 11,754,935 B2
Lithographic patterning device multichannel position and level gauge
Yuli Vladimirsky, Weston, CT (US); and Lev Ryzhikov, Norwalk, CT (US)
Assigned to ASML HOLDING N.V., Veldhoven (NL)
Appl. No. 17/616,081
Filed by ASML HOLDING N.V., Veldhoven (NL)
PCT Filed May 26, 2020, PCT No. PCT/EP2020/064609
§ 371(c)(1), (2) Date Dec. 2, 2021,
PCT Pub. No. WO2020/249394, PCT Pub. Date Dec. 17, 2020.
Claims priority of provisional application 62/861,615, filed on Jun. 14, 2019.
Prior Publication US 2022/0299893 A1, Sep. 22, 2022
Int. Cl. G03F 9/00 (2006.01); G03F 7/00 (2006.01)
CPC G03F 9/7088 (2013.01) [G03F 7/7085 (2013.01); G03F 9/7011 (2013.01)] 20 Claims
OG exemplary drawing
1. A patterning device alignment system comprising:
a multichannel sensory array including a first collimating radiation path and one or more other radiation paths;
a first detector positioned at a first end of the first collimating radiation path; and
a second detector positioned at a first end of the one or more other radiation paths,
the first detector arranged to receive a reflected illumination beam from an illuminated patterning device and configured to calculate a tilt parameter of the patterning device, and
the second detector arranged to receive a second reflected illumination beam from a beam splitter and configured to calculate an X-Y planar location position and a rotation position of the patterning device.