US 11,754,922 B2
Resist composition and method of forming resist pattern
Masatoshi Arai, Kawasaki (JP); and KhanhTin Nguyen, Kawasaki (JP)
Assigned to Tokyo Ohka Kogyo Co., Ltd., Kawasaki (JP)
Filed by TOKYO OHKA KOGYO CO., LTD., Kawasaki (JP)
Filed on Jun. 23, 2021, as Appl. No. 17/304,622.
Claims priority of application No. 2020-117209 (JP), filed on Jul. 7, 2020.
Prior Publication US 2022/0019142 A1, Jan. 20, 2022
Int. Cl. G03F 7/039 (2006.01); C08F 212/12 (2006.01); G03F 7/038 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01); C08F 220/30 (2006.01); C08F 212/14 (2006.01); C08F 220/40 (2006.01); C08F 212/34 (2006.01); C08F 212/02 (2006.01)
CPC G03F 7/039 (2013.01) [C08F 212/02 (2013.01); C08F 212/12 (2013.01); C08F 212/24 (2020.02); C08F 212/34 (2013.01); C08F 220/1808 (2020.02); C08F 220/1809 (2020.02); C08F 220/1811 (2020.02); C08F 220/283 (2020.02); C08F 220/301 (2020.02); C08F 220/40 (2013.01); G03F 7/038 (2013.01)] 5 Claims
 
1. A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
a resin component (A1) which exhibits changed solubility in a developing solution under action of acid,
wherein the resin component (A1) has a constitutional unit (a01) derived from a compound represented by General Formula (a01-1):

OG Complex Work Unit Chemistry
wherein W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, Xt represents a group that forms a monocyclic or polycyclic alicyclic group together with Ct, wherein part or all of hydrogen atoms which the monocyclic or polycyclic alicyclic group has may be substituted with a substituent, Ra1 to Ra3 each independently represents a hydrocarbon group having 1 to 10 carbon atoms, which may have a substituent, or a hydrogen atom, or two or more of Ra1 to Ra3 are bonded to each other to form an aliphatic ring, provided that not all of Ra1 to Ra3 are hydrogen atoms, and n represents 0 or 1.