US 11,752,577 B2
Laser apparatus and substrate etching method using the same
Yeonghwan Ko, Yongin-si (KR); Taekil Oh, Seoul (KR); Gyoowan Han, Yongin-si (KR); Jooseob Ahn, Hwaseong-si (KR); and Yoongyeong Bae, Goyang-si (KR)
Assigned to Samsung Display Co., Ltd., Yongin-si (KR)
Filed by Samsung Display Co., Ltd., Yongin-Si (KR)
Filed on Nov. 11, 2019, as Appl. No. 16/680,148.
Claims priority of application No. 10-2018-0140998 (KR), filed on Nov. 15, 2018.
Prior Publication US 2020/0156187 A1, May 21, 2020
Int. Cl. B23K 26/36 (2014.01); B23K 26/06 (2014.01); B23K 26/362 (2014.01); G02B 27/10 (2006.01); G02B 19/00 (2006.01); G02B 27/28 (2006.01); B23K 26/0622 (2014.01); B23K 26/073 (2006.01); B23K 26/067 (2006.01)
CPC B23K 26/362 (2013.01) [B23K 26/0604 (2013.01); B23K 26/067 (2013.01); B23K 26/0622 (2015.10); B23K 26/0626 (2013.01); B23K 26/0643 (2013.01); B23K 26/0648 (2013.01); B23K 26/0652 (2013.01); B23K 26/0665 (2013.01); B23K 26/073 (2013.01); G02B 19/0009 (2013.01); G02B 27/1093 (2013.01); G02B 27/283 (2013.01)] 20 Claims
OG exemplary drawing
1. A laser apparatus, comprising:
a laser generator generating at least one input light, wherein the input light is a laser beam;
an optical system converting the input light, which is provided from the laser generator, into an output light including a plurality of pattern lights; and
a stage, on which a target object is loaded, the output light being irradiated onto the target object,
wherein the optical system includes a light dividing part, a light condensing part, and a first processing part disposed on a focal point of the light condensing part and divides the input light into a plurality of divided lights having at least partially different phases,
the pattern lights are produced by constructive interference of the plurality of divided lights, and
a diameter of each of the pattern lights is smaller than a diameter of the input light.