US 12,413,201 B2
Bulk acoustic wave resonator with patterned layer structures, devices and systems
Dariusz Burak, Fort Collins, CO (US); Kevin J. Grannen, Thornton, CO (US); and Jack Lenell, Fort Collins, CO (US)
Assigned to QXONIX INC., Irvine, CA (US)
Filed by Qxonix Inc., Irvine, CA (US)
Filed on Dec. 3, 2023, as Appl. No. 18/527,326.
Application 18/527,326 is a continuation of application No. 17/564,216, filed on Dec. 29, 2021, granted, now 11,870,416.
Application 18/527,326 is a continuation of application No. 17/380,011, filed on Jul. 20, 2021, granted, now 11,863,153, issued on Jan. 2, 2024.
Application 17/564,216 is a continuation of application No. PCT/US2020/043733, filed on Jul. 27, 2020.
Application 17/380,011 is a continuation of application No. 16/940,172, filed on Jul. 27, 2020, granted, now 11,101,783, issued on Aug. 24, 2021.
Claims priority of provisional application 62/881,085, filed on Jul. 31, 2019.
Claims priority of provisional application 62/881,074, filed on Jul. 31, 2019.
Claims priority of provisional application 62/881,091, filed on Jul. 31, 2019.
Claims priority of provisional application 62/881,087, filed on Jul. 31, 2019.
Claims priority of provisional application 62/881,061, filed on Jul. 31, 2019.
Claims priority of provisional application 62/881,094, filed on Jul. 31, 2019.
Claims priority of provisional application 62/881,077, filed on Jul. 31, 2019.
Prior Publication US 2024/0146281 A1, May 2, 2024
Int. Cl. H03H 9/13 (2006.01); H03H 3/02 (2006.01); H03H 9/02 (2006.01); H03H 9/17 (2006.01); H03H 9/205 (2006.01); H03H 9/54 (2006.01); H03H 9/56 (2006.01)
CPC H03H 9/02259 (2013.01) [H03H 3/02 (2013.01); H03H 9/02015 (2013.01); H03H 9/0207 (2013.01); H03H 9/02102 (2013.01); H03H 9/0211 (2013.01); H03H 9/02157 (2013.01); H03H 9/13 (2013.01); H03H 9/131 (2013.01); H03H 9/17 (2013.01); H03H 9/173 (2013.01); H03H 9/175 (2013.01); H03H 9/205 (2013.01); H03H 9/54 (2013.01); H03H 9/568 (2013.01); H03H 2003/021 (2013.01); H03H 2009/02165 (2013.01)] 34 Claims
OG exemplary drawing
 
1. A bulk acoustic millimeter wave resonator comprising:
a substrate;
a piezoelectric stack including at least a first piezoelectric layer, a second piezoelectric layer, and a third piezoelectric layer acoustically coupled with one another, in which the first piezoelectric layer and the second piezoelectric layer and the third piezoelectric layer have respective thicknesses to facilitate a main resonant frequency of the bulk acoustic millimeter wave resonator;
an electrode electrically and acoustically coupled with the third piezoelectric layer; and
a patterned layer associated with the electrode, in which the patterned layer is acoustically coupled with the third piezoelectric to facilitate a suppression of a spurious mode of the bulk acoustic millimeter wave resonator.