US 12,412,773 B2
Vacuum chuck
Po-Yu Su, Keelung (TW); Young-Wei Lin, Taoyuan (TW); Yu Liang Huang, Taoyuan (TW); Chia-Ching Lee, Taoyuan (TW); Chi-Chun Peng, Hsinchu County (TW); Chen Liang Chang, New Taipei (TW); and Kuo Hui Chang, Taoyuan County (TW)
Assigned to Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed by Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu (TW)
Filed on Jul. 28, 2022, as Appl. No. 17/876,381.
Prior Publication US 2024/0038571 A1, Feb. 1, 2024
Int. Cl. H01L 21/683 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01)
CPC H01L 21/6838 (2013.01) [H01L 21/68721 (2013.01); H01L 21/67288 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A vacuum chuck, comprising:
a central vacuum portion including a workpiece surface;
a peripheral edge spaced outward from the central vacuum portion, the peripheral edge surrounding the central vacuum portion;
a peripheral drainage portion present between the peripheral edge and the central vacuum portion, the peripheral drainage portion including a drainage channel and a plurality of extensions, and the plurality of extensions extend from the peripheral edge to the drainage channel; and
a vacuum line extending into the central vacuum portion, the vacuum line including a vacuum opening at the workpiece surface of the central vacuum portion.