US 12,412,767 B2
Apparatus for treating substrate and method for treating substrate
Gui Su Park, Chungcheongnam-do (KR); Jun Young Choi, Chungcheongbuk-do (KR); Young Jin Jang, Chungcheongnam-do (KR); Yong Sun Ko, Gyeonggi-do (KR); Kyu Hwan Chang, Chungcheongnam-do (KR); and Jun Hyun Lim, Seoul (KR)
Assigned to SEMES CO., LTD., Chungcheongnam-Do (KR)
Filed by SEMES CO., LTD., Chungcheongnam-do (KR)
Filed on Nov. 4, 2022, as Appl. No. 17/980,995.
Prior Publication US 2023/0147919 A1, May 11, 2023
Int. Cl. H01L 21/67 (2006.01); B08B 3/08 (2006.01); B08B 13/00 (2006.01); F26B 5/00 (2006.01); G03F 7/20 (2006.01); H01L 21/677 (2006.01); H01L 21/687 (2006.01); B25J 11/00 (2006.01)
CPC H01L 21/67718 (2013.01) [B08B 3/08 (2013.01); B08B 13/00 (2013.01); F26B 5/005 (2013.01); G03F 7/2043 (2013.01); H01L 21/68707 (2013.01); B25J 11/0095 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A substrate treating apparatus comprising:
a first process treating unit configured to treat a substrate in a single-type method;
a second process treating unit configured to treat a substrate in a batch-type method; and
a posture changing unit configured to transfer the substrate between the first process treating unit and the second process treating unit and to change a posture of the substrate between a vertical posture and a horizontal posture,
wherein the posture changing unit comprises:
a posture changing treating bath having a storage space for storing the substrate and includes at least one of a first, second, or third treating liquid; and
a posture changing robot configured to discharge the substrate immersed in liquid within the storage space one by one, change the posture of the substrate from the vertical posture to the horizontal posture, and transfer the substrate to a buffer unit,
wherein the buffer unit is configured to store the substrate in the horizontal posture.