US 12,411,502 B2
Flow control system, method, and apparatus
Daniel T. Mudd, Reno, NV (US); Marshall B. Grill, Reno, NV (US); Norman L. Batchelor, II, Sparks, NV (US); Sean Joseph Penley, Sparks, NV (US); Michael Maeder, Reno, NV (US); Patti J. Mudd, Reno, NV (US); Zachariah Ezekiel McIntyre, Houston, TX (US); Tyler James Wright, Reno, NV (US); Matthew Eric Kovacic, Reno, NV (US); and Christopher Bryant Davis, Georgetown, TX (US)
Assigned to ICHOR SYSTEMS, INC., Fremont, CA (US)
Filed by Ichor Systems, Inc., Fremont, CA (US)
Filed on Oct. 5, 2023, as Appl. No. 18/481,298.
Application 18/481,298 is a continuation of application No. 17/468,042, filed on Sep. 7, 2021, granted, now 11,815,920.
Application 17/468,042 is a continuation of application No. 17/027,333, filed on Sep. 21, 2020, granted, now 11,144,075, issued on Oct. 12, 2021.
Application 17/468,042 is a continuation of application No. 16/985,635, filed on Aug. 5, 2020, granted, now 11,585,444, issued on Feb. 21, 2023.
Application 17/468,042 is a continuation of application No. 16/985,540, filed on Aug. 5, 2020, granted, now 11,639,865, issued on May 2, 2023.
Application 17/468,042 is a continuation of application No. 16/864,117, filed on Apr. 30, 2020, granted, now 11,424,148, issued on Apr. 30, 2022.
Application 17/027,333 is a continuation in part of application No. 16/383,844, filed on Apr. 15, 2019, granted, now 10,782,710, issued on Sep. 22, 2020.
Application 17/468,042 is a continuation in part of application No. 16/282,737, filed on Feb. 22, 2019, granted, now 10,838,437, issued on Nov. 17, 2020.
Application 16/864,117 is a continuation of application No. 15/717,562, filed on Sep. 27, 2017, granted, now 10,679,880, issued on Jun. 9, 2020.
Application 16/383,844 is a continuation of application No. 15/638,742, filed on Jun. 30, 2017, granted, now 10,303,189, issued on May 28, 2019.
Claims priority of provisional application 62/882,794, filed on Aug. 5, 2019.
Claims priority of provisional application 62/882,814, filed on Aug. 5, 2019.
Claims priority of provisional application 62/633,945, filed on Feb. 22, 2018.
Claims priority of provisional application 62/400,324, filed on Sep. 27, 2016.
Claims priority of provisional application 62/357,113, filed on Jun. 30, 2016.
Prior Publication US 2024/0028055 A1, Jan. 25, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G05D 7/01 (2006.01); F16K 27/00 (2006.01); G01F 1/684 (2006.01); G01F 15/00 (2006.01); G05D 7/06 (2006.01)
CPC G05D 7/0126 (2013.01) [F16K 27/003 (2013.01); G01F 1/6842 (2013.01); G01F 1/6847 (2013.01); G01F 15/002 (2013.01); G05D 7/0635 (2013.01); G05D 7/0682 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of manufacturing a semiconductor device, the method comprising:
a) supplying a gas to a gas inlet of a gas flow control apparatus, the gas flow control apparatus comprising:
a gas flow path extending from the gas inlet to a gas outlet;
a proportional valve operably coupled to the gas flow path;
an on/off valve operably coupled to the gas flow path between the proportional valve and the gas outlet, a volume of the gas flow path being defined between the proportional valve and the on/off valve; and
a flow restrictor having a flow impedance operably coupled to the gas flow path and located between the proportional valve and the gas outlet;
b) pressurizing the volume with the gas to a target pre-flow pressure by opening the proportional valve while the on/off valve is in an off-state, the target pre-flow pressure selected, in view of the flow impedance of the flow restrictor, to achieve the predetermined flow rate;
c) opening the on/off valve by moving the on/off valve to an on-state, thereby delivering the gas to the gas outlet at the predetermined flow rate; and
d) flowing the gas from the gas outlet to a semiconductor manufacturing process.