US 12,411,415 B2
Lithographic apparatus and method for illumination uniformity correction
Nikolaos Sotiropoulos, Eindhoven (NL); Albertus Hartgers, Berkel-Enschot (NL); Michael Frederik Ypma, Zaltbommel (NL); and Marco Matheus Louis Steeghs, Sevenum (NL)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Appl. No. 18/282,246
Filed by ASML Netherlands B.V., Veldhoven (NL)
PCT Filed Feb. 24, 2022, PCT No. PCT/EP2022/054615
§ 371(c)(1), (2) Date Sep. 15, 2023,
PCT Pub. No. WO2022/199969, PCT Pub. Date Sep. 29, 2022.
Claims priority of application No. 21164836 (EP), filed on Mar. 25, 2021.
Prior Publication US 2024/0160108 A1, May 16, 2024
Int. Cl. G03F 7/00 (2006.01)
CPC G03F 7/70141 (2013.01) [G03F 7/70066 (2013.01); G03F 7/70525 (2013.01); G03F 7/7085 (2013.01); G03F 7/70891 (2013.01)] 13 Claims
OG exemplary drawing
 
1. A lithographic apparatus comprising:
an illumination system configured to condition a radiation beam;
a uniformity correction system configured to adjust an intensity profile of the radiation beam;
a control system configured to control the uniformity correction system at least partially based on a thermal status criterion that is indicative of a thermal state of a part of the lithographic apparatus;
a measurement system configured to measure a thermal deformation of the part of the lithographic apparatus, wherein the thermal status criterion comprises a monitored component and wherein the monitored component comprises a measurement performed by the measurement system;
a sensing system configured to measure a temperature of the part of the lithographic apparatus, wherein the thermal status criterion comprises a monitored component and wherein the monitored component comprises a measurement performed by the sensing system; and
a cooling system configured to provide a flow of coolant configured to cool the part of the lithographic apparatus, wherein the sensing system is configured to measure a temperature of the coolant.