US 12,411,407 B2
Resist composition and patterning process
Jun Hatakeyama, Joetsu (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Filed by Shin-Etsu Chemical Co., Ltd., Tokyo (JP)
Filed on Oct. 19, 2022, as Appl. No. 17/969,087.
Claims priority of application No. 2021-172282 (JP), filed on Oct. 21, 2021.
Prior Publication US 2023/0131303 A1, Apr. 27, 2023
Int. Cl. G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01)
CPC G03F 7/0048 (2013.01) [G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); G03F 7/2006 (2013.01)] 12 Claims
 
1. A resist composition comprising a base polymer and a quencher,
said quencher comprising a salt compound consisting of a cyclic ammonium cation having the formula (A-1) or (A-2) and an anion derived from a fluorinated 1,3-diketone compound, fluorinated β-keto ester compound or fluorinated imide compound,

OG Complex Work Unit Chemistry
wherein m is an integer of 1 to 6,
R1 is a C1-C30 hydrocarbyl group in case of m=1, a single bond or a C1-C30 hydrocarbylene group in case of m=2, and a C1-C30 m-valent hydrocarbon group in case of m=3 to 6, the hydrocarbyl group, hydrocarbylene group and m-valent hydrocarbon group may contain at least one moiety selected from hydroxy, thiol, ester bond, thioester bond, thionoester bond, ether bond, sulfide bond, halogen exclusive of iodine and bromine, nitro, amino, amide bond, sulfonyl, sulfonic ester bond, sultone ring, lactam ring, and carbonate bond,
R2 and R3 are each independently a C1-C6 saturated hydrocarbyl group, R2 and R3 may bond together to form a ring with the carbon atom to which they are attached,
R4 and R6 are each independently hydrogen, a C1-C4 alkyl group or C2-C12 alkoxycarbonyl group,
R5 is a C1-C6 aliphatic hydrocarbyl group or C6-C12 aryl group, which may be substituted with halogen or trifluoromethyl,
the ring R is a C2-C10 alicyclic group containing the nitrogen atom.