US 12,411,331 B2
High numerical aperture selective plane illumination microscopy
Bo Huang, San Francisco, CA (US); and Bin Yang, San Francisco, CA (US)
Assigned to The Regents of the University of California, Oakland, CA (US)
Filed by The Regents of the University of California, Oakland, CA (US)
Filed on Dec. 21, 2023, as Appl. No. 18/392,789.
Application 18/392,789 is a continuation of application No. 16/966,829, granted, now 11,874,451, previously published as PCT/US2019/016086, filed on Jan. 31, 2019.
Claims priority of provisional application 62/624,261, filed on Jan. 31, 2018.
Prior Publication US 2024/0142760 A1, May 2, 2024
This patent is subject to a terminal disclaimer.
Int. Cl. G02B 21/02 (2006.01); G02B 21/06 (2006.01); G02B 21/16 (2006.01); G02B 21/18 (2006.01); G02B 21/33 (2006.01)
CPC G02B 21/33 (2013.01) [G02B 21/02 (2013.01); G02B 21/06 (2013.01); G02B 21/16 (2013.01); G02B 21/18 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A microscopy system comprising:
a first objective positioned adjacent to a sample to be imaged, the first objective being configured to both illuminate the sample with oblique illumination light and collect light from the sample, wherein the first objective is configured to be surrounded by or immersed in a first medium having a first index of refraction; and
a remote imaging module positioned remotely from the first objective and the sample, the remote imaging module being configured to rotate the image plane of the collected light to account for an angle of the oblique illumination light, the remote imaging module including a second objective and a third objective, wherein the second objective is configured to be surrounded by or immersed in a second medium having a second index of refraction and wherein the third objective is configured to be surrounded by or immersed in a third medium having a third index of refraction that is different than the second index of refraction.