| CPC G02B 21/06 (2013.01) [G02B 21/367 (2013.01)] | 7 Claims |

|
1. A method for ptychography position correction based on probe weighting, comprising:
S1: collecting diffraction light field intensity information of each scan position of a sample to be tested and simultaneously initializing information functions of illumination probes and the sample to be tested and probe positions;
S2: multiplying information parameters of the sample to be tested and the illumination probes at each scan position to obtain an exit wave;
S3: importing the exit wave obtained in step S2 into a propagation model to obtain a simulated diffraction light field, replacing intensity information in the simulated diffraction light field with the diffraction light field intensity information obtained in step S1, and obtaining an updated diffraction light field;
S4: importing the updated diffraction light field into a backpropagation model and obtaining a diffraction exit wave;
S5: updating the information functions of the sample to be tested and the illumination probes at each scan position based on the exit wave obtained in step S1 and the diffraction exit wave obtained in step S4;
S6: forming a probe matrix around the probe positions, calculating a correlation with the updated information functions of the sample to be tested and the illumination probes, and accordingly updating the probe positions; and
S7: repeating steps S2 to S6 to iterate until a predetermined number of iterations is completed or a predetermined condition is reached according to the updated information functions of the illumination probes and the sample to be tested and the updated probe positions, outputting the information functions of the illumination probes and the sample to be tested and the probe positions, and accordingly completing the ptychography position correction.
|