US 12,410,522 B2
Substrate processing apparatus and method for processing substrates
Dieter Pierreux, Dilbeek (BE); Werner Knaepen, Leuven (BE); Bert Jongbloed, Oud-Heverlee (BE); and Jeroen Fluit, Amsterdam (NE)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP Holding B.V., Almere (NL)
Filed on Jan. 26, 2023, as Appl. No. 18/101,666.
Application 18/101,666 is a continuation of application No. 16/797,346, filed on Feb. 21, 2020, granted, now 11,629,407.
Claims priority of provisional application 62/809,191, filed on Feb. 22, 2019.
Prior Publication US 2023/0175136 A1, Jun. 8, 2023
Int. Cl. C23C 16/48 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01)
CPC C23C 16/48 (2013.01) [C23C 16/4405 (2013.01); C23C 16/45553 (2013.01); C23C 16/4583 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A reaction chamber comprising:
a rack configured to hold a plurality of substrates, wherein the plurality of substrates are aligned vertically in the rack;
an illumination system configured to produce ultraviolet radiation within a range from 100 to 500 nanometers, wherein the illumination system is constructed and arranged to irradiate ultraviolet radiation onto a top surface of each of the plurality of substrates in the rack in the reaction chamber, wherein the illumination system is configured such that the average direction of the ultraviolet radiation is at an angle in the range of 80 to 89.5 degrees with respect to a line perpendicular to the top surfaces of the plurality of substrates; and
a power controller configured to control the power of the illumination system, wherein the power controller is programmed to adjust a radiation output of the illumination system along a width of the rack.