US 12,410,202 B2
Group V and VI transition metal precursors for thin film deposition
Guocan Li, Tempe, AZ (US); Sergei V. Ivanov, Tempe, AZ (US); Xinjian Lei, Tempe, AZ (US); and Hongbo Li, Tempe, AZ (US)
Assigned to Versum Materials US, LLC, Tempe, AZ (US)
Appl. No. 17/616,470
Filed by VERSUM MATERIALS US, LLC, Tempe, AZ (US)
PCT Filed May 28, 2020, PCT No. PCT/US2020/034908
§ 371(c)(1), (2) Date Dec. 3, 2021,
PCT Pub. No. WO2020/247237, PCT Pub. Date Dec. 10, 2020.
Claims priority of provisional application 62/857,650, filed on Jun. 5, 2019.
Prior Publication US 2022/0315612 A1, Oct. 6, 2022
Int. Cl. C07F 9/00 (2006.01); C01B 21/06 (2006.01); C23C 16/34 (2006.01); C23C 16/455 (2006.01)
CPC C07F 9/005 (2013.01) [C01B 21/0617 (2013.01); C23C 16/34 (2013.01); C23C 16/45536 (2013.01); C23C 16/45553 (2013.01)] 53 Claims
OG exemplary drawing
 
1. A precursor having a chemical structure selected from the group consisting of:

OG Complex Work Unit Chemistry
wherein:
M1 is selected from the group consisting of vanadium, tantalum, niobium, chromium, molybdenum and tungsten;
X is a halide selected from chloride (Cl), bromide (Br) and iodide (I);
R1 is a linear or branched C1-C10 alkyl, an amino group or an ether group for A and B, and is a linear or branched C1-C10 alkyl, an amino group or an ether group but not tert-butyl for C and G;
R2 is a linear or branched C2-C10 alkylene;
R3, R4 and R6 are independently selected from the group consisting of a linear or branched C1-C10 alkyl, an amino group and an ether group;
R5 is selected from the group consisting of hydrogen and a linear or branched C1-C10 alkyl;
L is selected from the group consisting of R1, OR1 and NR1R3;
L1 is a substituted or unsubstituted cyclopentadienyl ligand;
L2 is NR1R3;
m has a value of 0, 1 or 2, and
n has a value of 1, 2, 3 or 4.
 
51. A precursor supply package, comprising a vessel and (i) a precursor having a chemical structure selected from the group consisting of:

OG Complex Work Unit Chemistry
wherein:
M1 is selected from the group consisting of vanadium, tantalum, niobium, chromium, molybdenum and tungsten;
X is a halide selected from chloride (Cl), bromide (Br) and iodide (I);
R1 is a linear or branched C1-C10 alkyl, an amino group or an ether group for A and B; and is a linear or branched C1-C10 alkyl, an amino group or an ether group but not tert-butyl for C and G;
R2 is a linear or branched C2-C10 alkylene;
R3, R4 and R6 are independently selected from the group consisting of a linear or branched C1-C10 alkyl, an amino group and an ether group;
R5 is selected from the group consisting of hydrogen and a linear or branched C1-C10 alkyl;
L is selected from the group consisting of R1, OR1 and NR1R3;
L1 is a substituted or unsubstituted cyclopentadienyl ligand;
L2 is NR1R3;
m has a value of 0, 1 or 2; and
n has a value of 1, 2, 3 or 4, or
(ii) a composition thereof, wherein the vessel is adapted to contain and dispense the precursor or composition thereof.