US 12,409,612 B2
Bonding method and apparatus of substrates
Jung-Hua Chang, Hsinchu County (TW); and Pei-Yun Chiang, Hsinchu County (TW)
Assigned to SKY TECH INC., Hsinchu County (TW)
Filed by SKY TECH INC., Hsinchu County (TW)
Filed on Sep. 26, 2023, as Appl. No. 18/373,270.
Prior Publication US 2025/0100232 A1, Mar. 27, 2025
Int. Cl. B29C 65/48 (2006.01)
CPC B29C 65/4825 (2013.01) [B29C 2791/006 (2013.01)] 9 Claims
OG exemplary drawing
 
1. A bonding method of substrates for bonding a first substrate and a second substrate, comprising:
placing the first substrate on a holder in a confined chamber;
evacuating air from the confined chamber to vacuum the confined chamber to a predetermined low-pressure value;
placing the second substrate on a top of the first substrate;
pressing the second substrate onto the first substrate;
allowing an outside atmosphere air to enter the confined chamber by a first flow coefficient; and allowing the outside atmosphere air to enter the confined chamber by a second flow coefficient;
wherein the second flow coefficient is greater than the first flow coefficient.