US 12,409,404 B2
Scrubber system and wet cleaning method using the same
Young Seok Roh, Suwon-si (KR); Suji Gim, Hwaseong-si (KR); Heesub Kim, Busan (KR); Hee Ock Park, Suwon-si (KR); Jongyong Bae, Hwaseong-si (KR); Sung Chul Yoon, Hwaseong-si (KR); Sunsoo Lee, Yongin-si (KR); Dong Keun Jeon, Hwaseong-si (KR); and Jinkyoung Joo, Gwangmyeong-si (KR)
Assigned to Samsung Electronics Co., Ltd., Gyeonggi-do (KR); and Global Standard Technology Co., LTD, Gyeonggi-do (KR)
Filed by Samsung Electronics Co., Ltd., Suwon-si (KR)
Filed on Feb. 15, 2024, as Appl. No. 18/442,528.
Application 18/442,528 is a division of application No. 17/502,463, filed on Oct. 15, 2021, granted, now 11,931,683.
Claims priority of application No. 10-2021-0007386 (KR), filed on Jan. 19, 2021.
Prior Publication US 2024/0181380 A1, Jun. 6, 2024
Int. Cl. B01D 47/06 (2006.01); H01J 37/32 (2006.01); B08B 9/08 (2006.01)
CPC B01D 47/06 (2013.01) [H01J 37/32844 (2013.01); B08B 9/0813 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A wet cleaning method, comprising:
supplying a first gas from a first process chamber into an inflow chamber through a first inflow portion;
supplying a second gas from a second process chamber into the inflow chamber through a second inflow portion;
colliding the first and second gases with each other within the inflow chamber;
rising the first and second gases toward a scrubber housing that is placed on the inflow chamber, the first and second inflow portions being below the scrubber housing;
downwardly spraying a cleaning solution through a spray nozzle in the scrubber housing above the inflow chamber and the first and second inflow portions; and
hydrolyzing an ingredient, the ingredient being included in at least one of the first gas or the second gas, with the cleaning solution sprayed through the spray nozzle.