US 12,409,403 B2
Server dust sensor and filter mechanism
William Andrew Mecham, Elk Grove, CA (US); Ryan Kelsey Albright, Beaverton, OR (US); Aaron Richard Carkin, Hillsboro, OR (US); William Ryan Weese, Portland, OR (US); Benjamin Goska, Portland, OR (US); and Michael Scott Thompson, Wilsonville, OR (US)
Assigned to NVIDIA Corporation, Santa Clara, CA (US)
Filed by NVIDIA Corporation, Santa Clara, CA (US)
Filed on Jun. 9, 2022, as Appl. No. 17/836,462.
Prior Publication US 2023/0398483 A1, Dec. 14, 2023
Int. Cl. B01D 46/46 (2006.01); B01D 46/44 (2006.01); G01N 15/06 (2006.01); G08B 21/18 (2006.01); H05K 5/02 (2006.01); H05K 7/14 (2006.01); G01N 15/00 (2006.01); G01N 15/075 (2024.01)
CPC B01D 46/442 (2013.01) [B01D 46/46 (2013.01); G01N 15/06 (2013.01); G08B 21/18 (2013.01); H05K 5/0213 (2013.01); H05K 7/1488 (2013.01); B01D 2279/45 (2013.01); G01N 2015/0046 (2013.01); G01N 15/075 (2024.01)] 20 Claims
OG exemplary drawing
 
1. A particulate mitigation and management system, comprising:
a particulate sensor configured to detect an amount of particulate in air that is associated with an environmental space over time;
an enclosure comprising an interior chamber and an airflow port disposed through at least one side of the enclosure and defining an airflow path extending from an exterior space outside of the enclosure to the interior chamber of the enclosure, wherein the enclosure is a server rack, wherein the interior chamber comprises one or more circuits, and wherein the exterior space corresponds to a space in a server facility that houses the server rack;
an actuator configured to move between a first position and a second position; and
a filter operatively connected to the actuator, the filter comprising at least one porous filtration substrate portion, wherein, in the first position, the at least one porous filtration substrate portion is arranged in the airflow path providing a filtered flow path between the exterior space and the interior chamber, wherein, in the second position, the at least one porous filtration substrate portion is arranged outside of the airflow path providing an unfiltered flow path between the exterior space and the interior chamber.