CPC H01L 24/32 (2013.01) [H01L 23/3107 (2013.01); H01L 24/27 (2013.01); H01L 24/29 (2013.01); H01L 24/83 (2013.01); H01L 2224/29187 (2013.01); H01L 2224/32145 (2013.01); H01L 2224/32225 (2013.01); H01L 2224/83005 (2013.01); H01L 2224/83896 (2013.01)] | 28 Claims |
1. A method of forming a bonded structure, the method comprising:
forming a first dielectric layer on a first element and on a third element, the first dielectric layer being formed on an upper surface and a side surface of each of the first and the third elements;
forming a second dielectric layer on a second element and on a fourth element, the second dielectric layer being formed on an upper surface and a side surface of each of the second and fourth elements;
polishing a surface of the first dielectric layer; and
directly bonding the polished surface of a first portion of the first dielectric layer that is disposed on the first element to a first portion of the second dielectric layer that is disposed on the second element to form a first bonded structure without an adhesive, and directly bonding the polished surface of a second portion of the first dielectric layer that is disposed on the third element to a second portion of the second dielectric layer that is disposed on the fourth element to form a second bonded structure without an adhesive, wherein the first bonded structure is spaced from the second bonded structure by a gap.
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