US 12,080,566 B2
Substrate treating apparatus and substrate treating method
Taiki Hinode, Kyoto (JP); Takashi Ota, Kyoto (JP); Mitsukazu Takahashi, Kyoto (JP); Kazuhiro Honsho, Kyoto (JP); and Yusuke Akizuki, Kyoto (JP)
Assigned to SCREEN Holdings Co., Ltd., (JP)
Appl. No. 17/640,858
Filed by SCREEN Holdings Co., Ltd., Kyoto (JP)
PCT Filed May 25, 2020, PCT No. PCT/JP2020/020548
§ 371(c)(1), (2) Date Mar. 7, 2022,
PCT Pub. No. WO2021/053885, PCT Pub. Date Mar. 25, 2021.
Claims priority of application No. 2019-171511 (JP), filed on Sep. 20, 2019.
Prior Publication US 2022/0344176 A1, Oct. 27, 2022
Int. Cl. H01L 21/67 (2006.01); B05C 5/02 (2006.01); B05C 11/08 (2006.01); B05C 11/10 (2006.01); H01L 21/68 (2006.01)
CPC H01L 21/67023 (2013.01) [B05C 5/02 (2013.01); B05C 11/08 (2013.01); B05C 11/1039 (2013.01); H01L 21/67242 (2013.01); H01L 21/68 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A substrate treating apparatus, comprising:
a treating unit configured to treat a substrate; and
a controller configured to control the treating unit,
the treating unit including:
a substrate holder configured to hold the substrate in a horizontal posture;
a rotation driving unit configured to rotate the substrate holder;
a treatment liquid supplying unit configured to supply a treatment liquid to the substrate held by the substrate holder;
a liquid collecting unit including two or more guards located so as to surround the substrate holder laterally, and a liquid inlet defined by the guards and open toward the substrate held by the substrate holder; and
a guard driving unit configured to move at least one or more of the guards in a vertical direction,
the controller controlling the guard driving unit in accordance with a shape of the substrate held by the substrate holder, thereby changing at least either a height position of an upper end of the liquid inlet or a height position of a lower end of the liquid inlet.