CPC H01L 21/0228 (2013.01) [B82Y 10/00 (2013.01); H01L 21/02178 (2013.01); H01L 21/02181 (2013.01); H01L 21/022 (2013.01); H01L 21/28194 (2013.01); H01L 21/3105 (2013.01); H01L 29/0673 (2013.01); H01L 29/1606 (2013.01); H01L 29/24 (2013.01); H01L 29/42384 (2013.01); H01L 29/4908 (2013.01); H01L 29/517 (2013.01); H01L 29/66439 (2013.01); H01L 29/66742 (2013.01); H01L 29/775 (2013.01); H01L 29/778 (2013.01); H01L 29/78603 (2013.01); H01L 29/78645 (2013.01); H01L 29/78681 (2013.01); H01L 29/78684 (2013.01); H01L 29/78696 (2013.01); H10B 63/30 (2023.02); H10N 50/01 (2023.02); H10N 70/011 (2023.02); H01L 29/0676 (2013.01)] | 19 Claims |
1. A semiconductor structure comprising a nanofog oxide adhered to an inert 2D or 3D surface or a weakly reactive metal surface, the nanofog oxide consisting essentially of 0.5-2 nm Al2O3 nanoparticles.
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