	US 12,080,529 B2
	Plasma processing apparatus and prediction method of the condition of plasma processing apparatus
Yoshito Kamaji, Tokyo (JP); and Masahiro Sumiya, Tokyo (JP)
Assigned to HITACHI HIGH-TECH CORPORATION, Tokyo (JP)
Filed by Hitachi High-Tech Corporation, Tokyo (JP)
Filed on Dec. 1, 2020, as Appl. No. 17/108,383.
Application 17/108,383 is a division of application No. 15/904,917, filed on Feb. 26, 2018, granted, now 10,886,110.
Claims priority of application No. 2017-179668 (JP), filed on Sep. 20, 2017.
Prior Publication US 2021/0082673 A1, Mar. 18, 2021
Int. Cl. H01J 37/32 (2006.01); G06F 17/18 (2006.01); G06N 3/048 (2023.01); G06N 7/00 (2023.01); G06N 20/10 (2019.01); H01J 37/24 (2006.01); G05B 13/00 (2006.01); G05B 13/04 (2006.01); H05H 13/00 (2006.01)

CPC H01J 37/32926 (2013.01) [G06F 17/18 (2013.01); G06N 3/048 (2023.01); G06N 7/00 (2013.01); G06N 20/10 (2019.01); H01J 37/24 (2013.01); H01J 37/32 (2013.01); H01J 37/32082 (2013.01); H01J 37/32192 (2013.01); H01J 37/32449 (2013.01); H01J 37/32972 (2013.01); H01J 37/3299 (2013.01); G05B 13/00 (2013.01); G05B 13/04 (2013.01); H01J 2237/1825 (2013.01); H01J 2237/334 (2013.01); H01J 2237/335 (2013.01); H05H 13/005 (2013.01)]

4 Claims

1. A plasma processing method comprising:

predicting a state of a plasma processing apparatus having a processing chamber in which a sample is subjected to plasma processing, based on a first soundness index value obtained by analyzing a first data obtained from the plasma processing apparatus using a first algorithm and a second soundness index value obtained by analyzing a second data obtained from the plasma processing apparatus using a second algorithm; and

performing plasma processing of the sample based on the predicted state of the plasma processing apparatus,

wherein the first algorithm is an algorithm in which a first time of the plasma processing is a time in which the state is determined as abnormal by the first soundness index value,

wherein the second algorithm is an algorithm in which a second time of the plasma processing is a time within a range of a third time to a fourth time,

wherein the second time of the plasma processing is a time in which the state is determined as abnormal by the second soundness index value,

wherein the third time is a time obtained by subtracting a predetermined time from the first time, and

wherein the fourth time is a time obtained by adding the predetermined time to the first time.