CPC G03F 7/70033 (2013.01) [G03F 7/70025 (2013.01); G03F 7/709 (2013.01); G06N 20/00 (2019.01)] | 20 Claims |
1. A method, comprising:
performing a photolithography process by generating extreme ultraviolet light in an extreme ultraviolet light generation chamber, wherein generating extreme ultraviolet light includes generating extreme ultraviolet light by generating a plasma from droplets within the extreme ultraviolet light generation chamber;
generating sensor signals with a plurality of vibration sensors coupled to the extreme ultraviolet light generation chamber, wherein the plurality of vibration sensors are coupled to a collector mirror of the extreme ultraviolet light generation chamber;
analyzing the sensor signals; and
adjusting a parameter of extreme ultraviolet light generation based on the sensor signals.
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