US 12,078,931 B2
Metal mask
Seil Kim, Hwaseong-si (KR); Jongbum Kim, Yongin-si (KR); Junghyun Ahn, Seongnam-si (KR); and Sang Min Yi, Suwon-si (KR)
Assigned to Samsung Display Co., Ltd., Yongin-si (KR)
Filed by Samsung Display Co., Ltd., Yongin-si (KR)
Filed on Dec. 7, 2020, as Appl. No. 17/113,948.
Claims priority of application No. 10-2020-0029699 (KR), filed on Mar. 10, 2020.
Prior Publication US 2021/0286268 A1, Sep. 16, 2021
Int. Cl. H01L 21/308 (2006.01); C23C 14/04 (2006.01); G03F 7/20 (2006.01)
CPC G03F 7/2002 (2013.01) [C23C 14/042 (2013.01); G09G 2330/04 (2013.01); Y10T 428/12361 (2015.01); Y10T 428/12389 (2015.01)] 15 Claims
OG exemplary drawing
 
1. A metal mask comprising a metal thin film having a first thickness and having:
a first region comprising a transmission region defining first openings penetrating the metal thin film, and a non-transmission region comprising a first etching portion having a second thickness that is smaller than the first thickness; and
a second region adjacent the first region, and defining second openings penetrating the metal thin film,
wherein an opening density of the first region is less than an opening density of the second region, the opening density of the first region being defined as a number of the first openings per an area of the first region, and the opening density of the second region being defined as a number of the second openings per an area of the second region,
wherein the non-transmission region further comprises a second etching portion neighboring the first etching portion, and a rib portion between the first etching portion and the second etching portion and spaced apart from the first openings,
wherein the rib portion has a third thickness that is smaller than the first thickness.