	US 12,078,929 B2
	Photosensitive resin composition, pattern forming method, cured film, laminate, and device
Toshihide Aoshima, Shizuoka (JP); and Kenta Yamazaki, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Jun. 2, 2021, as Appl. No. 17/336,335.
Application 17/336,335 is a continuation of application No. PCT/JP2019/046709, filed on Nov. 29, 2019.
Claims priority of application No. 2018-228557 (JP), filed on Dec. 5, 2018.
Prior Publication US 2021/0302835 A1, Sep. 30, 2021
Int. Cl. G03F 7/004 (2006.01); G03F 7/029 (2006.01); G03F 7/031 (2006.01); G03F 7/032 (2006.01); G03F 7/037 (2006.01); G03F 7/038 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01)

CPC G03F 7/0042 (2013.01) [G03F 7/0045 (2013.01); G03F 7/029 (2013.01); G03F 7/031 (2013.01); G03F 7/032 (2013.01); G03F 7/0387 (2013.01); G03F 7/11 (2013.01); G03F 7/2002 (2013.01); G03F 7/325 (2013.01); G03F 7/40 (2013.01)]

23 Claims

1. A photosensitive resin composition comprising:

at least one precursor selected from the group consisting of a polyimide precursor and a polybenzoxazole precursor;

a compound having a sulfurous ester structure; and

a photoradical polymerization initiator,

wherein the photosensitive resin composition satisfies at least one of the following conditions 1, . . . , or 3;

the condition 1: the precursor contains a radically polymerizable group,

the condition 2: the compound having a sulfurous ester structure contains a radically polymerizable group, and

the condition 3: the photosensitive resin composition further contains a compound containing a radically polymerizable group, other than the precursor and the compound having a sulfurous ester structure.